@article{ART002735703,
author={Sung-Yong Chun and 김성종},
title={Enhancement of the Corrosion Resistance of CrN Film Deposited by Inductively Coupled Plasma Magnetron Sputtering},
journal={CORROSION SCIENCE AND TECHNOLOGY},
issn={1598-6462},
year={2021},
volume={20},
number={3},
pages={112-117},
doi={10.14773/cst.2021.20.3.112},
url={http://www.j-cst.org/main/aissue_view.htm?scode=C&vol=20&no=3}
}

TY - JOUR
AU - Sung-Yong Chun
AU - 김성종
TI - Enhancement of the Corrosion Resistance of CrN Film Deposited by Inductively Coupled Plasma Magnetron Sputtering
T2 - CORROSION SCIENCE AND TECHNOLOGY
JO - CORROSION SCIENCE AND TECHNOLOGY
PY - 2021
VL - 20
IS - 3
PB - 한국부식방식학회
SP - 112
EP - 117
SN - 1598-6462
AB - Inductively coupled plasma magnetron sputtering (ICPMS) has the advantage of being able to dramaticallyimprove coating properties by increasing the plasma ionization rate and the ion bombardment effectduring deposition. Thus, this paper presents the comparative results of CrN films deposited by direct currentmagnetron sputtering (dcMS) and ICPMS systems. The structure, microstructure, and mechanical andcorrosive properties of the CrN coatings were investigated by X-ray diffractometry, scanning electronmicroscopy, nanoindentation, and corrosion-resistance measurements. The as-deposited CrN films byICPMS grew preferentially on a 200 plane compared to dcMS on a 111 plane. As a result, the films depositedby ICPMS had a very compact microstructure with high hardness. The nanoindentation hardnessreached 19.8 GPa, and 13.5 GPa by dcMS. The corrosion current density of CrN film prepared by ICPMSwas about 9.8 × 10-6 mA/cm2, which was 1/470 of 4.6 × 10-3 mA/cm2, the corrosion current density of CrNfilm prepared by dcMS.
KW - Corrosion resistance, CrN, Films, Inductively coupled plasma, Sputtering
DO - 10.14773/cst.2021.20.3.112
UR - http://www.j-cst.org/main/aissue_view.htm?scode=C&vol=20&no=3
ER -

Sung-Yong Chun and 김성종. 2021, "Enhancement of the Corrosion Resistance of CrN Film Deposited by Inductively Coupled Plasma Magnetron Sputtering", CORROSION SCIENCE AND TECHNOLOGY, vol.20, no.3 pp.112-117. Available from: doi:10.14773/cst.2021.20.3.112

Sung-Yong Chun, 김성종 "Enhancement of the Corrosion Resistance of CrN Film Deposited by Inductively Coupled Plasma Magnetron Sputtering" CORROSION SCIENCE AND TECHNOLOGY 20.3 pp.112-117 (2021) : 112.

Sung-Yong Chun, 김성종. Enhancement of the Corrosion Resistance of CrN Film Deposited by Inductively Coupled Plasma Magnetron Sputtering. 2021; 20(3), 112-117. Available from: doi:10.14773/cst.2021.20.3.112

Sung-Yong Chun and 김성종. "Enhancement of the Corrosion Resistance of CrN Film Deposited by Inductively Coupled Plasma Magnetron Sputtering" CORROSION SCIENCE AND TECHNOLOGY 20, no.3 (2021) : 112-117.doi: 10.14773/cst.2021.20.3.112

Sung-Yong Chun; 김성종. Enhancement of the Corrosion Resistance of CrN Film Deposited by Inductively Coupled Plasma Magnetron Sputtering. CORROSION SCIENCE AND TECHNOLOGY, 20(3), 112-117. doi: 10.14773/cst.2021.20.3.112

Sung-Yong Chun; 김성종. Enhancement of the Corrosion Resistance of CrN Film Deposited by Inductively Coupled Plasma Magnetron Sputtering. CORROSION SCIENCE AND TECHNOLOGY. 2021; 20(3) 112-117. doi: 10.14773/cst.2021.20.3.112

Sung-Yong Chun, 김성종. Enhancement of the Corrosion Resistance of CrN Film Deposited by Inductively Coupled Plasma Magnetron Sputtering. 2021; 20(3), 112-117. Available from: doi:10.14773/cst.2021.20.3.112

Sung-Yong Chun and 김성종. "Enhancement of the Corrosion Resistance of CrN Film Deposited by Inductively Coupled Plasma Magnetron Sputtering" CORROSION SCIENCE AND TECHNOLOGY 20, no.3 (2021) : 112-117.doi: 10.14773/cst.2021.20.3.112