@article{ART001865382,
author={최용준 and 강경문 and 박형호},
title={Compositional Study of Surface, Film, and Interface of Photoresist-Free Patternable SnO2 Thin Film on Si Substrate Prepared by Photochemical Metal-Organic Deposition},
journal={마이크로전자 및 패키징학회지},
issn={1226-9360},
year={2014},
volume={21},
number={1},
pages={13-17},
doi={http://dx.doi.org/10.6117/kmeps.2014.21.1.013}
}

TY - JOUR
AU - 최용준
AU - 강경문
AU - 박형호
TI - Compositional Study of Surface, Film, and Interface of Photoresist-Free Patternable SnO2 Thin Film on Si Substrate Prepared by Photochemical Metal-Organic Deposition
T2 - 마이크로전자 및 패키징학회지
JO - 마이크로전자 및 패키징학회지
PY - 2014
VL - 21
IS - 1
PB - 한국마이크로전자및패키징학회
SP - 13
EP - 17
SN - 1226-9360
AB - The direct-patternable SnO2 thin film was successfully fabricated by photochemical metal-organic deposition. The composition and chemical bonding state of SnO2 thin film were analyzed by using X-ray photoelectron spectroscopy(XPS) from the surface to the interface with Si substrate. XPS depth profiling analysis allowed the determination of theatomic composition in SnO2 film as a function of depth through the evolution of four elements of C 1s, Si 2p, Sn 3d,and O 1s core level peaks. At the top surface, nearly stoichiometric SnO2 composition (O/Sn ratio is 1.92.) was observeddue to surface oxidation but deficiency of oxygen was increased to the interface of patterned SnO2/Si substrate wherethe O/Sn ratio was about 1.73~1.75 at the films. This O deficient state of the film may act as an n-type semiconductorand allow SnO2 to be applied as a transparent electrode in optoelectronic applications.
KW - Tin dioxide, N-type semiconductor, Photochemical metal-organic deposition, XPS depth profiling
DO - http://dx.doi.org/10.6117/kmeps.2014.21.1.013
ER -

최용준, 강경문 and 박형호. 2014, "Compositional Study of Surface, Film, and Interface of Photoresist-Free Patternable SnO2 Thin Film on Si Substrate Prepared by Photochemical Metal-Organic Deposition", 마이크로전자 및 패키징학회지, vol.21, no.1 pp.13-17. Available from: doi:http://dx.doi.org/10.6117/kmeps.2014.21.1.013

최용준, 강경문, 박형호 "Compositional Study of Surface, Film, and Interface of Photoresist-Free Patternable SnO2 Thin Film on Si Substrate Prepared by Photochemical Metal-Organic Deposition" 마이크로전자 및 패키징학회지 21.1 pp.13-17 (2014) : 13.

최용준, 강경문, 박형호. Compositional Study of Surface, Film, and Interface of Photoresist-Free Patternable SnO2 Thin Film on Si Substrate Prepared by Photochemical Metal-Organic Deposition. 2014; 21(1), 13-17. Available from: doi:http://dx.doi.org/10.6117/kmeps.2014.21.1.013

최용준, 강경문 and 박형호. "Compositional Study of Surface, Film, and Interface of Photoresist-Free Patternable SnO2 Thin Film on Si Substrate Prepared by Photochemical Metal-Organic Deposition" 마이크로전자 및 패키징학회지 21, no.1 (2014) : 13-17.doi: http://dx.doi.org/10.6117/kmeps.2014.21.1.013

최용준; 강경문; 박형호. Compositional Study of Surface, Film, and Interface of Photoresist-Free Patternable SnO2 Thin Film on Si Substrate Prepared by Photochemical Metal-Organic Deposition. 마이크로전자 및 패키징학회지, 21(1), 13-17. doi: http://dx.doi.org/10.6117/kmeps.2014.21.1.013

최용준; 강경문; 박형호. Compositional Study of Surface, Film, and Interface of Photoresist-Free Patternable SnO2 Thin Film on Si Substrate Prepared by Photochemical Metal-Organic Deposition. 마이크로전자 및 패키징학회지. 2014; 21(1) 13-17. doi: http://dx.doi.org/10.6117/kmeps.2014.21.1.013

최용준, 강경문, 박형호. Compositional Study of Surface, Film, and Interface of Photoresist-Free Patternable SnO2 Thin Film on Si Substrate Prepared by Photochemical Metal-Organic Deposition. 2014; 21(1), 13-17. Available from: doi:http://dx.doi.org/10.6117/kmeps.2014.21.1.013

최용준, 강경문 and 박형호. "Compositional Study of Surface, Film, and Interface of Photoresist-Free Patternable SnO2 Thin Film on Si Substrate Prepared by Photochemical Metal-Organic Deposition" 마이크로전자 및 패키징학회지 21, no.1 (2014) : 13-17.doi: http://dx.doi.org/10.6117/kmeps.2014.21.1.013